MASKING DEVICE AND THIN FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a masking device and a thin film deposition method in which a thin film can easily be deposited on a face having ruggedness with a pattern of high precision. SOLUTION: This masking device is used for depositing a thin film on a face having ruggedness. The masking device has recessed parts 11 and projected parts 12 which can follow ruggedness of the face and has an opening 13 for thin film deposition penetrating from one side to the confronted other side.