Chemically amplified positive resist composition

摘要

A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A) : At least one polymeric unit of an alicyclic lactone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B) : At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of ( alpha ) beta -(meth)acryloyloxy- gamma -butyrolactone represented by the following formula (IV): (C) A polymeric unit which becomes alkali-soluble by cleavage of a part of groups by the action of an acid.