发明名称 FILM DEPOSITION METHOD, FILM DEPOSITION SYSTEM, OPTICAL MEMBER AND ALIGNER
摘要 PROBLEM TO BE SOLVED: To solve the problem that a film grown into columnar structure has low film packing ratio which causes cracking in a direction perpendicular to the film surface, and allow to penetrate foreign matter such as water from outside till an interface between a substrate and the film, so that the film becomes easy to slip on the substrate and also to be swollen. SOLUTION: The film deposition method by sputtering, in which two cathode electrodes are provided at least and two or more materials different in composition are used as targets, has a process and system in which during a whole or a part of the period of the deposition, both or either of the above two cathode electrodes is made to discharge alternately and able to deposit films different in composition.
申请公布号 JP2001279437(A) 申请公布日期 2001.10.10
申请号 JP20000092996 申请日期 2000.03.28
申请人 NIKON CORP 发明人 FURUTA MASAHIRO
分类号 G02B1/10;C23C14/34;(IPC1-7):C23C14/34 主分类号 G02B1/10
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