ALKALI NEGATIVE DEVELOPMENT TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN AND ELECTRONIC PARTS

摘要

PROBLEM TO BE SOLVED: To provide an alkali negative development type photosensitive resin composition which gives a pattern excellent in adhesiveness to a base substrate and having a good shape after development with an aqueous alkali solution and imparts high resolution by development, a method for producing a pattern by which the production is carried out by development with a low-cost aqueous alkali solution and a pattern excellent in adhesiveness to a base substrate and having a good shape is obtained after development, and to provide electronic parts excellent in reliability. SOLUTION: The alkali negative development type photosensitive resin composition contains (a) a polyimide precursor having an acid functional group in its molecular chain and soluble in an aqueous alkali solution, (b) a photosensitive agent and (c) a silicon compound having a reactive unsaturated functional group and an alkoxy or acyloxy group.