发明名称 Sputtering assembly and target therefor
摘要 A cathode assembly includes a monolithic target having a first surface and a center region. In addition, a sculpted section is formed in the first surface, and the sculpted section is generally recessed from the first surface and extends around the center in a racetrack configuration. The racetrack has a concentric centerline, and the sculpted section preferably is generally symmetric about the centerline. A magnetic field generator is disposed adjacent to the target and produces a magnetic field having an in-plane component. The magnetic field generator is tuned so that a distribution of the magnitude of the in-plane component in a direction transverse to the centerline at a point along the racetrack is characterized by two peaks that have a generally equal magnitude.
申请公布号 US6299740(B1) 申请公布日期 2001.10.09
申请号 US20000487082 申请日期 2000.01.19
申请人 VEECO INSTRUMENT, INC. 发明人 HIERONYMI ROBERT G.;LUTZ GARY D.
分类号 C23C14/34;C23C14/35;(IPC1-7):C23C14/35 主分类号 C23C14/34
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