发明名称 Thin-film transistor and fabrication method for same
摘要 A thin-film transistor (TFT) which has a crystalline silicon active layer of excellent reliability and characteristics, and a method of fabricating such a TFT inexpensively are provided. In a TFT which has at least two low density impurity regions and a source/drain adjacent to a channel-forming region, catalyst elements which cause amorphous silicon to crystallize are included in the source/drain, and the density of said catalyst elements in the interface between the channel-forming region and the low-density impurity regions is less than that in the source/drain.
申请公布号 US6300659(B1) 申请公布日期 2001.10.09
申请号 US19990459339 申请日期 1999.12.13
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 ZHANG HONGYONG;TAKAYAMA TORU;TAKEMURA YASUHIKO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L29/00 主分类号 H01L21/20
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