METHOD FOR PREPARING PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a method for treating a resin for a resist in such a way that the treated resin gives a high resolution image with few defects when used in a prescription for a microelectronic device such as a chemical amplification type resist. SOLUTION: A resin for a resist is subjected to fractional treatment or extraction treatment with a solvent such as methylene chloride to remove a low molecular component.