POWER SUPPLY METHOD TO DISCHARGE ELECTRODE, HIGH- FREQUENCY PLASMA GENERATION METHOD, AND SEMICONDUCTOR- MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a power supply method to a discharge electrode, a high-frequency plasma generation method, and a semiconductor thin-film manufacturing method that can generate a uniform plasma with large area, and perform uniform treatment to a large substrate or the like in a plasma CVD utilizing a very high frequency(VHF) or the like. SOLUTION: In this power supply method to the discharge electrode for generating a discharge state based on high-frequency power that is fed to the discharge electrode, a high-frequency power supply where high frequencies with a different oscillation frequency are independent each other is used, and the generation of a standing wave is inhibited by difference in the frequency of each power supply.