发明名称 CHARGED BEAM APPARATUS AND PATTERN INCLINE OBSERVATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a charged beam apparatus applicable to an in line evaluation which has a function of high speed and high precision incline observation as well as an incline observation method of a pattern. SOLUTION: A charged beam apparatus 10, which has an electron gun 12, a condenser lens 22, a scan deflector 26, an objective lens 28, and a secondary electron detector 82, is furnished further with a deflector 32 for observing inclination, arranged between the objective lens 28 and a sample S, which deflects a charged beam 6 just before incidence on the sample face to be incident at an angle with respect to a sample S. The deflection angle of the charged beam 6 is controlled by D.C. component being input to the deflector 32 for observing inclination. The deviation of an irradiation spot of the charged beam 6 due to an incline deflection is corrected and controlled by the observation position, feeding back an input value as well as an incline angle of the defector 32 for observing inclination to an input value of the scan deflector 26.
申请公布号 JP2001273861(A) 申请公布日期 2001.10.05
申请号 JP20000089909 申请日期 2000.03.28
申请人 TOSHIBA CORP;TOPCON CORP 发明人 ABE HIDEAKI;YAMAZAKI YUICHIRO;SUGIHARA KAZUYOSHI;INOUE MASAHIRO
分类号 G03F7/20;G01N23/20;G21K1/087;G21K7/00;H01J37/141;H01J37/147;H01J37/20;H01J37/22;H01J37/28;H01L21/027;H01L21/66;(IPC1-7):H01J37/147 主分类号 G03F7/20
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