| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon ring which can focus a generated plasma to a wafer, while making uniform the temperature distribution in the wafer plane. SOLUTION: The silicon ring is arranged on the periphery of a wafer on the side of an electrode for mounting the wafer in a plasma treating system, provided with a power supply section and has self-heating function, and the plasma treating system is provided with the silicon ring. |
