DRY ETCHING METHOD, MICROMACHINING METHOD AND MASK FOR DRY ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a dry etching method required for micromachining a proper shape, a micromachining method and a mask for dry etching. SOLUTION: Etching is performed, using carbon monoxide gas added with a compound gas containing nitrogen as a reaction gas, and using a mask made of tantalum or tantalum nitride.