发明名称 |
SURFACE TREATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a surface treating method by which a spindle shape with a high aspect ratio is formed on an optical element so as to form an antireflection structure having antireflection effect to light having a wider wavelength range and small dependency on incident angle. SOLUTION: A metallic mask is formed on an optical element in a dot array shape and the optical element is subjected to reactive ion etching. At this time, the optical element is etched until the metallic mask vanishes after the gradual reduction of the diameter of the mask and a spindle shape is formed on the optical element. |
申请公布号 |
JP2001272505(A) |
申请公布日期 |
2001.10.05 |
申请号 |
JP20000088524 |
申请日期 |
2000.03.24 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY CORP;TAKAHARA HIROSHIGE |
发明人 |
TAKAHARA HIROSHIGE;TOYODA HIROSHI |
分类号 |
C03C15/00;C23F4/00;G02B1/11;G02B1/12 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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