| 摘要 |
Charged-particle-beam (CPB) microlithography apparatus are disclosed that do not require installation in a magnetically shielded room, and that exhibit improved attenuation of the incursion of magnetic fields, originating in linear motors used to drive motions of the reticle and substrate stages, to the charged particle beam. The illumination-optical and projection-optical systems are enclosed in respective columns made of a thick ferromagnetic material. The reticle and substrate chambers are similarly constructed. Consequently, there is very low incursion of external magnetic fields to the beam in the columns. The reticle and substrate chambers include partition shields, each having a multi-layer construction with alternating layers of ferromagnetic material sandwiched with layers of non-magnetic material, attached via non-magnetic material to the respective chambers. The partition shields prevent magnetic fields from the respective linear motors from reaching the beam inside the columns.
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