| 摘要 |
An exposure apparatus of the present invention provides a mask having a first space formed by a protection member, which protects a pattern formation area on a mask substrate, and a frame, which supports the protection member, inside a second space, and transfers the pattern of the mask provided in the second space onto a substrate by using an energy beam from a light source. The apparatus has a gas replacement chamber which replaces gas in the first space with a predetermined gas, which the energy beam passes through, while maintaining a predetermined pressure in the first space.
|
