| 摘要 |
<p>A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The volume between the base assembly (104) and the internal membrane (150) forms the upper chamber (154) and the internal chamber (156), and the volume between the internal membrane (150) and the external membrane (152) forms the outer chamber (158). The internal membrane (150) includes a circular central portion (170), a relatively thick annular portion (174), an annular inner flap (176) that extends from the corner of the thick portion (174), an annular outer flap (178) that extends from the outer rim of the thick portion (174) and an annular connector portion (172). The inner flap (176) and the outer flap (178) can be formed of a first elastomer, whereas the thick portion (174) and connector portion (172) can be formed of a second elastomer.</p> |
