| 摘要 |
A method for the electrolytic polishing of a metal in the presence of an electrolyte composition, wherein said metal is a metal selected from the group of gallium, hafnium, antimonium, tantalum, titanium, vanadium, aluminium, molybdenum, niobium, tungsten and boron-doped silicon, or an alloy containing one or more of said metals, which metal is subjected to an electrolytic polishing process in an electrolyte composition comprising an inorganic or an organic sulphonic acid compound. |
