| 摘要 |
The present invention is directed to producing a resin which, when formed into a film, has excellent gas barrier and/or moisture barrier (low MVTR) properties. Further, the resin has a relatively high molecular weight distribution, preferably above 6, and has excellent processability/extrudability. The resin is produced using a cyclopentadienyl chromium compound, preferably a mono CpCr compound, on a support, preferably a silica support. A particularly preferred catalyst for use in the present invention comprises pentamethylcyclopentadienyidimethylchromiumpyridine. Preferably, the catalyst is used in a slurry polymerization process. |
