发明名称 OPTICAL SYNTHETIC QUARTZ GLASS, METHOD FOR HEAT-TREATING THE SAME, AND HEAT-TREATING APPARATUS FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain an optical synthetic quartz glass capable of exhibiting better transmissivity and laser resistance and to provide a method for heat- treating the optical synthetic quartz glass, and a heat-treating apparatus for the same. SOLUTION: This method for heat-treating the optical synthetic quartz glass is characterized in that the periphery of the synthetic quartz glass body which is a material to be treated is covered with an SiO2 powder having >=1×1019 molecules/cm3 dissolved hydrogen molecular concentration on the average and heat-treated in a heating furnace in the method for heat-treating the optical synthetic quartz glass in the heating furnace.
申请公布号 JP2001270725(A) 申请公布日期 2001.10.02
申请号 JP20000090157 申请日期 2000.03.29
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 UEDA TETSUJI;NISHIMURA HIROYUKI;FUJINOKI AKIRA
分类号 G02B1/02;C03B19/14;C03B20/00;C03B32/00;C03C3/06;C03C23/00;H01L21/027;(IPC1-7):C03B20/00 主分类号 G02B1/02
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