发明名称 |
OPTICAL SYNTHETIC QUARTZ GLASS, METHOD FOR HEAT-TREATING THE SAME, AND HEAT-TREATING APPARATUS FOR THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To obtain an optical synthetic quartz glass capable of exhibiting better transmissivity and laser resistance and to provide a method for heat- treating the optical synthetic quartz glass, and a heat-treating apparatus for the same. SOLUTION: This method for heat-treating the optical synthetic quartz glass is characterized in that the periphery of the synthetic quartz glass body which is a material to be treated is covered with an SiO2 powder having >=1×1019 molecules/cm3 dissolved hydrogen molecular concentration on the average and heat-treated in a heating furnace in the method for heat-treating the optical synthetic quartz glass in the heating furnace. |
申请公布号 |
JP2001270725(A) |
申请公布日期 |
2001.10.02 |
申请号 |
JP20000090157 |
申请日期 |
2000.03.29 |
申请人 |
SHINETSU QUARTZ PROD CO LTD |
发明人 |
UEDA TETSUJI;NISHIMURA HIROYUKI;FUJINOKI AKIRA |
分类号 |
G02B1/02;C03B19/14;C03B20/00;C03B32/00;C03C3/06;C03C23/00;H01L21/027;(IPC1-7):C03B20/00 |
主分类号 |
G02B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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