| 发明名称 |
Positive photoresist composition comprising a polysiloxane |
| 摘要 |
A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV):wherein Z' is a phenyl ring substituted with an acid-decomposable group and (b) a compound which decomposes upon exposure to generate an acid.
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| 申请公布号 |
US6296985(B1) |
申请公布日期 |
2001.10.02 |
| 申请号 |
US20000496259 |
申请日期 |
2000.02.01 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MIZUTANI KAZUYOSHI;YASUNAMI SHOICHIRO |
| 分类号 |
H01L21/027;C08G77/14;C08G77/26;C08K5/00;C08K5/10;C08K5/13;G03F7/004;G03F7/075;(IPC1-7):G03F7/004;C08J3/28 |
主分类号 |
H01L21/027 |
| 代理机构 |
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