| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing liquid supply device and its method capable of efficiently removing bubbles. SOLUTION: The processing liquid supply device is composed of a ejecting nozzle 67 for ejecting a resist liquid to a wafer, a resist tank 62 for housing the resist liquid, supply pipe lines 63a-63d for connecting the discharge nozzle 67 to tank 62, a pump 66 arranged between the supply pipe lines 63c and 63d, a pump driving structure for controlling the operation of the pump 66, a circulating pipe line 68, one end of which is branched from the pipe line 63b and another end of which is arranged in the pump 66, a filter 65 arranged between the supply pipe lines 63b and 63c and filtering the resist liquid to remove the bubbles, a drain pipe line 71 for discharging the resist liquid filtered with the filter 65 and containing the bubbles and a valve 71a arranged in the drain pipe line 71 and for controlling the flow rate of the resist liquid discharged from the filter 65. |
