| 摘要 |
PROBLEM TO BE SOLVED: To provide a device which is suitable for discomposing and depoisoning a hazardous substance. SOLUTION: This hazardous substance processing device is equipped with a reaction furnace 40, a feeding tank 48, a storage tank 47, a carrying pump 49, a liquid level gauge 53, and a liquid level control device 54 are provided. In this case, in the reaction furnace 40, a plasma flame is generated. The feeding tank 48 houses a hazardous substance solution. The storage tank 47 stores the hazardous substance solution. The carrying pump 49 feeds the hazardous substance solution stored in the storage tank 47 to the feeding tank 48. The liquid level gauge 53 measures the hazardous substance solution level in the feeding tank 48. The liquid level control device 54 controls the liquid feeding of the carrying pump 49 in such a manner that the liquid level of the hazardous substance solution in the feeding tank 48 may be kept at a set height by comparing a liquid level height measured by the liquid level gauge 53 and the set height. Then, holes provided on the reaction furnace side wall and the feeding tank side wall communicate so that the pressure in the reaction furnace 40 and the feeding tank 48 may become similar values. Also, holes provided on the bottom section of the feeding tank 48 and the bottom section of the reaction furnace 40 communicate with an introduction pipe 100 so that the hazardous substance solution may be fed from the feeding tank 48 into the reaction furnace 40 by gravitational force. |
