| 摘要 |
PURPOSE: Provided is a radiation-sensitive resin composition excellent in sensitivity and resolution, having a small light proximity effect, capable of accurately and stably forming a fine pattern even in an isolated line pattern, capable of ensuring a sufficient focus margin for the isolated line pattern and useful as a positive type or negative type chemical amplification type resist. CONSTITUTION: The radiation-sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having at least one amino group in which at least one hydrogen atom bonds to a nitrogen atom and substituting the hydrogen atom by a t-butoxycarbonyl group, (B) a radiation-sensitive acid generating agent and (C) (a) an acid dissoluble group-containing resin which is made alkali-soluble when the acid dissoluble group is dissociated or (b) an alkali-soluble resin and an alkali solubility controlling agent. The negative type radiation-sensitive resin composition contains the component (A), the component (B), an alkali-soluble resin as component (D) and a crosslinking agent as component (E).
|
