| 摘要 |
PROBLEM TO BE SOLVED: To enable the illuminating optical system of an exposure system to arbitrarily control the width of isolated lines of a reticle. SOLUTION: The exposure system is provided with a correction filter 1 which adjusts the quantity of light emitted from a light source 7 at every deformed light pattern in addition to a diaphragm mechanism 3 having various kinds of deformed light patterns for deforming illumination. Since the illumination in the image forming plane of an exposed object to be transferred can be made uniform, a plurality of isolated lines scattered in the pattern of the reticle can be transferred with accurate line widths.
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