| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam drawing method and its device where very thin line segments can be drawn without producing misalignment of line segments and deviation of a focusing point in a field linking system in which the misalignment and deviation are liable to occur. SOLUTION: By the use of an electron beam focusing sweeping device comprising an electron beam focusing system and an electron beam deflecting system, a focusing system is controlled so as to focus an electron beam constantly on a specific point on the surface of a specimen placed on a specimen pad in a state in which a specimen is kept, still, the actual position of the specimen pad is measured when the specimen pad is moved so as to enable an electron beam to move on the surface of the specimen to draw a graphic pattern in a state in which the focusing system is controlled as above, a positional deviation of the target position of the specimen pad corresponding to the above graphic pattern from the above actual position is obtained, and a prescribed graphic pattern is drawn through a process in which an electron beam on the surface of the specimen is deflected by the deflecting system so as to make the above positional deviation get zero constantly.
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