| 摘要 |
PROBLEM TO BE SOLVED: To improve the productivity and accuracy of a semiconductor manufacturing process by appropriately performing exposure and preparations simultaneously in parallel with each other. SOLUTION: At the time of performing a plurality of units of treatment by predicting the ending time of the treatment at every treatment unit in accordance with the purpose of operations, the offset time to the predicted ending time is set and the end of each treatment is noticed a desired period of time prior to the end of the treatment.
|
