METHOD FOR FORMING FINE PATTERNS AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To correct the irregular size of completed exposed images caused by the light proximity effect. SOLUTION: The exposure step subjected to a photoresist film is a multiple exposure step. The conditions of exposure of one exposure step comprising the multiple exposure step are set in such a way that the larger the distance between patterns, the more enlarged the exposed image is. The conditions of exposure of the other exposure step are set in such a way that the larger the distance between patterns, the more reduced the exposed image is.