发明名称 METHOD FOR CONTROLLING PROXIMITY EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To drastically shorten the time required for both of proximity gap control and alignment control. SOLUTION: This method executes the alignment control in parallel with the gap control at the point of the time a gap quantity attains a value at which the execution of the alignment control is possible when executing the gap control by moving a tilt stage 21 to a gap control start position. Namely, the method for controlling the proximity exposure executes the alignment control in parallel to the proximity gap control S31 to S3A. The alignment control is executed at the point of the time the gap quantity attains the value at which the execution of the alignment processing is possible in a prescribed step S35 of the proximity gap control. The proximity gap control and the alignment control are carried out partly in parallel, by which the time heretofore required for both control may be made shorter by as much as the time component when both are simultaneously executed.
申请公布号 JP2001265013(A) 申请公布日期 2001.09.28
申请号 JP20000077167 申请日期 2000.03.17
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 NIREI TAKASHI;MINEGISHI MANABU
分类号 G02F1/13;G03F9/00;G09F9/00;H01L21/027;(IPC1-7):G03F9/00 主分类号 G02F1/13
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