发明名称 MANUFACTURING METHOD OF WAFERS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a silicon wafer and the like at low cost and provide the silicon wafer and the like. SOLUTION: In a manufacturing method of a silicon wafer and the like, the wafer after being sliced from an ingot and cleaned is etched on the front and rear faces and, if desired, side faces by plasma.
申请公布号 JP2001267292(A) 申请公布日期 2001.09.28
申请号 JP20000076663 申请日期 2000.03.17
申请人 MEMC JAPAN LTD 发明人 KUBOTA MASASHI;YOSHIMURA ICHIRO
分类号 H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/302
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