| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having high sensitivity and high Dmax and giving a low fog image optimum for use in a photomechanical process. SOLUTION: The heat developable photosensitive material contains at least (a) photosensitive silver halide, (b) a reducible silver salt, (c) a reducing agent of formula (1), (d) a binder and (e) a phenol compound of formula (2)(where R1 an R2 are each H or a substitutent; X1-X3 are each H or a substituent other than bydroxy, when each of the substituents X1-X3 bonds to the phenol ring through N, it is an N-containing heterocyclic group or a group of the formula -NH-C(=O)-R4; R4 is an 8-40C substituent; and the substituents R1, R2 and X1-R3 may form a ring by bonding to each other) on the same face of the base.
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