发明名称 METHOD AND DEVICE FOR DETECTING DEFECT AND METHOD OF MANUFACTURING FOR MASK
摘要 PROBLEM TO BE SOLVED: To remove a pseudo defect due to the error of reference picture data and to highly precisely detect a micro defect. SOLUTION: At the time of comparing sensor picture data obtained by image- picking up a mask 6 by a sensor 4 with reference picture data and detecting the defect of a mask pattern formed on the mask 6, a data identification part 11 identifies an error occurred in reference picture data by using highly precise reference picture data generated by a highly precise reference picture generation part 9. A correction registration part 12 corrects/registers the result of the defect detection of the mask pattern based on the identification result.
申请公布号 JP2001266126(A) 申请公布日期 2001.09.28
申请号 JP20000078416 申请日期 2000.03.21
申请人 TOSHIBA CORP 发明人 OKUDA KENTARO
分类号 G01N21/956;G06T1/00;G06T7/00;H04N7/18 主分类号 G01N21/956
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