| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam drawing device whose distortional aberration can be easily corrected. SOLUTION: A charged particle beam drawing device is equipped with a charged particle source, an irradiation electron optical system which irradiates an object with a charged particle beam radiated from the charged particle source, a substrate which is provided with openings and irradiated with a charged particle beam by the irradiation electron optical system, element electron optical systems which form the intermediate images of charged particle beams penetrating through the openings bored in the substrate, a projection electron optical system which projects the intermediate mages onto a surface as an object of exposure, reducing them in size, deflectors which control blanking, deflecting charged particle beams that penetrates through the openings cut in the substrate, a modifying means which modifies a relative positional relation between the positions of the fore focal point and the charged particle source, and a control means which adjusts the positions of the intermediate images projected onto the exposure surface, controlling the positions of the deflectors separately and also the positioning mechanism.
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