| 摘要 |
PROBLEM TO BE SOLVED: To provide a work polishing apparatus wherein such foreign matters as an abrasive and abrasive residue do not remain on its work holder panel and the supporting member thereof, etc., when cleaning its work holder panel by its brushing material, and provide a cleaning method of its work holder panel, and further, provided a polishing method for polishing a work by using such a polishing apparatus. SOLUTION: A work polishing apparatus 1 has at least a work holder panel 2 for holding a work, an abrasive cloth 11 for polishing the work, and a cleaning mechanism for cleaning at least a work holding surface 2a of the work holder panel 2 by sliding a brushing material 5 relatively to the work holding surface 2a while feeding a cleaning liquid to the work holder panel 2. This polishing apparatus can be made capable of the removal of the brushing material from the work holder panel which is performed without stopping the relative operation of the brushing material to the work holding surface, a similar cleaning of a side surface 2b of the work holder panel which is to be performed preferably, continuous feeding of the cleaning liquid after the removal of the brushing material, continuous blowing or air on the work holder panel after the feeding of the cleaning liquid, and the removal of the cleaning liquid by rotating the work holder panel.
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