| 摘要 |
<p>A method and system for stripping a photoresist layer quickly. A pre-processing element (e.g., a pre-heater, pre-cooler, or pre-clamper) is integrated into a load lock chamber to increase throughput of the system. While a first wafer is processed inside a processing chamber, a second wafer is pre-processed using the pre-processing element.</p> |
