发明名称 Method for manufacturing feram device
摘要 A method for manufacturing a ferroelectric random access memory (FeRAM) device, the method including the steps of forming a unit die including a transistor and a capacitor on a semiconductor substrate, testing a wafer level function for the unit die, annealing the device above Curie temperature of ferroelectric material, and carrying out a package process for the device.
申请公布号 US2001024855(A1) 申请公布日期 2001.09.27
申请号 US20000739447 申请日期 2000.12.19
申请人 KANG EUNG-YOUL 发明人 KANG EUNG-YOUL
分类号 H01L27/105;H01L21/8246;(IPC1-7):H01L21/336 主分类号 H01L27/105
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