| 摘要 |
<p>An aqueous composition comprising ammonium hydroxide in an amount of about 1 to about 30 % by weight calculated as NH3 and a surface active agent represented by the formula XF2C (CFY)n SO3A wherein X=F, OH or SO3A; Y=F, H, OH or may be omitted thereby creating a double bond; n=1-12; A=NH4?+, H+, Na+, K+, Li+, R+¿ or organic amine cation and R is 1-4 straight chain alkyl group; and wherein the fluoroalkyl group is a linear group; and wherein the surface active agent is present in an amount of about 5 ppm to about 2000 ppm is useful for cleaning photomasks and especially chromium photomasks.</p> |
