发明名称 Vertical high voltage semiconductor device
摘要 The device has a semiconductor substrate of a first conductivity type, on which a more lightly doped semiconductor layer of an opposite, second conductivity type or of the first conductivity type is arranged in the form of a drift segment (1) for taking up the blocking voltage of the semiconductor device. In the drift segment, laterally aligned semiconductor regions (3,4;3'4') of first and second conductivity type are alternately arranged. The semiconductor regions (3,3') of the first conductivity type are connected to the semiconductor substrate, on which a first electrode (D;S) is arranged, by an electrically conductive connection (5,5') fed through the semiconductor layer (2,2'). The semiconductor regions (4,4') of the second conductivity type are connected to a second electrode (S,D) on the semiconductor layer by a further conductive connection (6,6') fed through the semiconductor regions (3,4;3',4').
申请公布号 DE10012610(A1) 申请公布日期 2001.09.27
申请号 DE20001012610 申请日期 2000.03.15
申请人 INFINEON TECHNOLOGIES AG 发明人 WERNER, WOLFGANG;AHLERS, DIRK
分类号 H01L29/06;H01L29/417;H01L29/78;H01L29/808;(IPC1-7):H01L29/78 主分类号 H01L29/06
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