SUBSTRATE WITH PHOTOCATALYTIC FILM AND METHOD FOR PRODUCING THE SAME

摘要

The surface resistance of a titanium oxide film can be controlled in 10<9> to 10<13> OMEGA /c by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under an oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.