The thin layer system is formed using a substrate which is supplied with a bias voltage while the layers of different materials are sputtered on to it in sequence to give smooth surfaces and a thin interdiffusion zone between them

摘要

To form a thin layer system with at least two layers of different materials, they are developed over each other by sputtering on to a substrate which has an applied bias voltage. The bias voltage is varied at the substrate while at least one layer is deposited, according to the layer thickness. The two materials for the layers are molybdenum and silicon. The bias voltage is varied at 0-200 V.