| 摘要 |
Water for storing silicon wafers and a storing method, capable of reducing the deposition of fine particles including metal on the surfaces of wafers, preventing etching of the surfaces of wafers by alkaline components in an abrasive, and preventing deterioration in wafer quality, especially in oxide film withstand voltage after cleaning or deterioration in haze and the deposition of particles. The water for storing silicon wafers in water, comprising an organic acid, having a chelate effect, added to pure water so as to provide a pH ranging from weak-acid to neutral or to add a nonionic surfactant.
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