发明名称 FILTERING SYSTEM OF PLASMA POLYMERIZATION EQUIPMENT
摘要 PURPOSE: A filtering system of plasma polymerization equipment is provided to improve existing problems such as performance deterioration of a plasma polymerization film and cumbersome periodical exchange of non-woven fabric by supplying a new system capable of efficiently filtering a discharged reactive gas without using the non-woven fabric. CONSTITUTION: The filtering system of plasma polymerization equipment comprises a particle separation part (24) flowing particles discharged from a chamber into the cylindrical body in a tangential direction, thereby separating the particles into large particles and small particles with centrifugal force; a collection part (22) which is positioned at the lower side of the particle separation part (24) and collects large particles being dropped by gravity; an inner cylinder (26) through which small particles pass as a cylinder which is installed inside the particle separation part (24); and a filtration part filtering small particles discharged from the inner cylinder (26) by wind pressure, wherein a vane part in which a plurality of vanes (25) are arranged for determining the size of centrifugal force of particles that are flown in from the inflow part inside the cylindrical body is formed in the particle separation part (24).
申请公布号 KR20010088079(A) 申请公布日期 2001.09.26
申请号 KR20000012088 申请日期 2000.03.10
申请人 LG ELECTRONICS INC. 发明人 KANG, SEONG HUI;OH, JEONG GEUN
分类号 C23C16/54;(IPC1-7):C23C16/54 主分类号 C23C16/54
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