| 摘要 |
PROBLEM TO BE SOLVED: To solve the problems that the coating of a crystalline film in which atoms are regularly arranged to a certain degree on a substrate of low temperature has been difficult, and therefore, as for a photocatalytic film having photocatalytic activity, the substrate should be heated. SOLUTION: As to this method in which, in a film deposition system in which an evacuated atmosphere can be controlled, a target pasted on a sputtering cathode is sputtered to coat a substrate with a film containing the components of the target material, the sputtered particles are passed through the inside of arc discharge plasma formed into the shape of a sheet almost parallel to the surface of the substrate and are activated before they arrive at the substrate. The substrate can be coated with a photocatalytic film of titanium oxide without being heated by using titanium metal as the target.
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