发明名称 |
METHOD FOR POST-TREATMENT OF THIN FILM, POST-TREATMENT DEVICE, POST-TREATED OPTICAL MEMBER AND ALIGNER PROVIDED WITH OPTICAL MEMBER |
摘要 |
PROBLEM TO BE SOLVED: To solve the problem of drastic decrease of transmittance of a pure crystal of metal fluoride, which originally exhibits excellent transmitlance to an F2 eximer laser beam, caused by thin film forming with a general thin film forming method such as vacuum deposition or sputtering and to solve the problem of the decrease of transmittance in optical members such as a lens or a prism resulting therefrom. SOLUTION: The post-treatment method contains a housing step in which a fluoride thin film with a fluorine defect film formed on a substrate is placed in a fluorine atmosphere at a specifically controlled temperature and a time measuring step for measuring the time consumed to raise temperature from the specific temperature so as to replenish the fluorine defect with fluorine. |
申请公布号 |
JP2001264512(A) |
申请公布日期 |
2001.09.26 |
申请号 |
JP20000083239 |
申请日期 |
2000.03.21 |
申请人 |
NIKON CORP |
发明人 |
TAKI YUSUKE |
分类号 |
G02B1/11;C01B9/08;H01L21/027 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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