发明名称 METHOD FOR POST-TREATMENT OF THIN FILM, POST-TREATMENT DEVICE, POST-TREATED OPTICAL MEMBER AND ALIGNER PROVIDED WITH OPTICAL MEMBER
摘要 PROBLEM TO BE SOLVED: To solve the problem of drastic decrease of transmittance of a pure crystal of metal fluoride, which originally exhibits excellent transmitlance to an F2 eximer laser beam, caused by thin film forming with a general thin film forming method such as vacuum deposition or sputtering and to solve the problem of the decrease of transmittance in optical members such as a lens or a prism resulting therefrom. SOLUTION: The post-treatment method contains a housing step in which a fluoride thin film with a fluorine defect film formed on a substrate is placed in a fluorine atmosphere at a specifically controlled temperature and a time measuring step for measuring the time consumed to raise temperature from the specific temperature so as to replenish the fluorine defect with fluorine.
申请公布号 JP2001264512(A) 申请公布日期 2001.09.26
申请号 JP20000083239 申请日期 2000.03.21
申请人 NIKON CORP 发明人 TAKI YUSUKE
分类号 G02B1/11;C01B9/08;H01L21/027 主分类号 G02B1/11
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