发明名称 WASTE HEAT RECOVERY AND MOISTURE DRYING SYSTEM OF PLASMA POLYMERIZATION EQUIPMENT
摘要 PURPOSE: A waste heat recovery and moisture drying system of a plasma polymerization equipment is provided to solve existing problems by effectively releasing heat inside a polymerization chamber, thereby preventing high temperature and removing residual moisture on the surface of a sample on the roll. CONSTITUTION: In a plasma polymerization equipment consisting of an unwider chamber unwinding a sample on a roll coiled around a bobbin, a polymerization chamber polymerizing the sample transferred from the unwinder chamber and a winder chamber rewinding the polymerized sample in a roll form, the waste heat recovery and moisture drying system of the plasma polymerization equipment using heat pump cycle comprises a plurality of pipes installed on the inner wall of the polymerization chamber; a pipe installed inside the bobbin around which the sample on the roll is coiled; a compressor (12) which is connected from the pipe on the inner wall of the polymerization chamber and connected to the pipe inside the bobbin; and an expansion valve (14) which is connected from the pipe inside the bobbin and connected to the pipe on the inner wall of the polymerization chamber.
申请公布号 KR20010088081(A) 申请公布日期 2001.09.26
申请号 KR20000012090 申请日期 2000.03.10
申请人 LG ELECTRONICS INC. 发明人 MUN, JEONG UK
分类号 C23C16/54;(IPC1-7):C23C16/54 主分类号 C23C16/54
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