| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface foreign matter inspecting method and inspecting device capable of conveniently making a total inspection for comparatively large foreign matter or a flaw or the like on a wafer or a liquid crystal substrate in a state of inspection standard is constant. SOLUTION: This device has illumination optical systems 3 and 4 illuminating substantially the whole face of an object 1 to be inspected, light receiving optical systems 5 and 7 collectively receiving scattered light from foreign matter adhered to a surface of the object for detecting the total quantity of scattered light by their pupil faces, and a spatial filter part 6 extracting light of a particular direction from the object.
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