| 摘要 |
PROBLEM TO BE SOLVED: To provide a platinum working method which is capable of finely working platinum with high accuracy without remaining of deposits ands does not damage the ground surface of the platinum in treatment after dry etching. SOLUTION: The platinum is worked to the prescribed shape by dry etching the platinum by a gaseous mixture containing rare gas, gaseous SF6 and gaseous Cl2 and after the platinum is worked to the prescribed shape by the method descried above, the mask is treated with an aqueous acidic solution in order to remove the reaction product derived from the platinum and gaseous mixture sticking to the mask. |
