PHASE SHIFT MASK AND METHOD FOR PRODUCING SAME

摘要

PURPOSE: To provide a high performance phase shift mask having satisfactory transmittance and aging stability even under a short wavelength light source and adaptable to the microfabrication and high integration of a semiconductor integrated circuit and a method for producing the mask. CONSTITUTION: A phase shifter for a 2nd light transmissive part is formed on a substrate transparent to light for exposure with a fluorine doped molybdenum silicide film or a fluorine doped chromium silicide film formed using SiF2 as a reactive gas.