发明名称 REACTIVE GAS INJECTION CONTROL METHOD FOR POLYMERIZATION APPARATUS USING PLASMA
摘要 PURPOSE: A reactive gas injection control method is provided to achieve an efficient plasma discharge by maximizing use efficiency of the reactive gas introduced into the polymerization chamber and the electric potential difference between anode and cathode. CONSTITUTION: A method is characterized in that the reactive gas injection into a polymerization chamber is performed in an intermittent manner so as to use most of the reactive gas injected into the polymerization chamber, for the polymerization process. The reactive gas injection time depends on the surface processing speed using plasma. An electrode for polymerization apparatus is constituted by a thin plate having a plurality of holes which are formed in a regular manner. The electrode has electrode holding portions formed at both ends of the electrode.
申请公布号 KR20010088101(A) 申请公布日期 2001.09.26
申请号 KR20000012117 申请日期 2000.03.10
申请人 LG ELECTRONICS INC. 发明人 KIM, CHEOL HWAN
分类号 H01J37/04;(IPC1-7):H01J37/04 主分类号 H01J37/04
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