发明名称 Polishing solution supply system
摘要 A polishing solution supply system can prevent precipitation of solutes on delivery pipes or interior walls of holding tanks so that a polishing solution of a constant solution concentration can be supplied to a polishing tool. The polishing solution supply system includes a stock solution supply source, a dilution solution supply source, and a mixing section for mixing a stock solution and a dilution solution to formulate the polishing solution. The mixing section is sealed hermetically to exclude external atmosphere. Delivery lines deliver the polishing solution to each of plural polishing sections.
申请公布号 US6293849(B1) 申请公布日期 2001.09.25
申请号 US19980181993 申请日期 1998.10.29
申请人 EBARA CORPORATION 发明人 KAWASHIMA KIYOTAKA
分类号 B24B37/04;B24B57/02;H01L21/304;(IPC1-7):B24C1/00;B24B1/00 主分类号 B24B37/04
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