发明名称 |
METHOD FOR CLEANING HIGH PURITY ALKALINE CHEMICAL LIQUID HANDLING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method for rapidly removing a contaminant due to a matal component in high purity alkaline chemical liquid handling equipment such as a container, of which at least the inner surface is constituted of a resin, at a high level. SOLUTION: Primary cleaning using a hydrochloric acid aqueous solution and/or a nitric acid aqueous solution is applied to the interior of the high purity alkaline chemical liquid handling equipment and secondary cleaning using both solutions is applied thereto.
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申请公布号 |
JP2001259544(A) |
申请公布日期 |
2001.09.25 |
申请号 |
JP20000076741 |
申请日期 |
2000.03.17 |
申请人 |
TOKUYAMA CORP |
发明人 |
AKASHI KENJI;OKA KAZUMASA;IDE KAZUICHI |
分类号 |
B08B3/08;H01L21/304;(IPC1-7):B08B3/08 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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