发明名称 METHOD FOR CLEANING HIGH PURITY ALKALINE CHEMICAL LIQUID HANDLING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method for rapidly removing a contaminant due to a matal component in high purity alkaline chemical liquid handling equipment such as a container, of which at least the inner surface is constituted of a resin, at a high level. SOLUTION: Primary cleaning using a hydrochloric acid aqueous solution and/or a nitric acid aqueous solution is applied to the interior of the high purity alkaline chemical liquid handling equipment and secondary cleaning using both solutions is applied thereto.
申请公布号 JP2001259544(A) 申请公布日期 2001.09.25
申请号 JP20000076741 申请日期 2000.03.17
申请人 TOKUYAMA CORP 发明人 AKASHI KENJI;OKA KAZUMASA;IDE KAZUICHI
分类号 B08B3/08;H01L21/304;(IPC1-7):B08B3/08 主分类号 B08B3/08
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