发明名称 METHOD FOR MANUFACTURING LIQUID DROP DISCHARGE HEAD
摘要 PROBLEM TO BE SOLVED: To highly accurately form a thickness of a diaphragm at low costs. SOLUTION: A high concentration boron diffuse layer 21 of a depth corresponding to the thickness of the diaphragm 10 is formed to one face of a silicon substrate 20. The silicon substrate is etched from the other face by a potassium hydroxide aqueous solution having an IPA added thereto.
申请公布号 JP2001260367(A) 申请公布日期 2001.09.25
申请号 JP20000079228 申请日期 2000.03.22
申请人 RICOH CO LTD 发明人 HASHIMOTO KENICHIRO;KOBATA YASUTAROU;YAMANAKA KUNIHIRO
分类号 B41J2/16;B41J2/045;B41J2/055;(IPC1-7):B41J2/16 主分类号 B41J2/16
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