发明名称 |
METHOD FOR MANUFACTURING LIQUID DROP DISCHARGE HEAD |
摘要 |
PROBLEM TO BE SOLVED: To highly accurately form a thickness of a diaphragm at low costs. SOLUTION: A high concentration boron diffuse layer 21 of a depth corresponding to the thickness of the diaphragm 10 is formed to one face of a silicon substrate 20. The silicon substrate is etched from the other face by a potassium hydroxide aqueous solution having an IPA added thereto.
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申请公布号 |
JP2001260367(A) |
申请公布日期 |
2001.09.25 |
申请号 |
JP20000079228 |
申请日期 |
2000.03.22 |
申请人 |
RICOH CO LTD |
发明人 |
HASHIMOTO KENICHIRO;KOBATA YASUTAROU;YAMANAKA KUNIHIRO |
分类号 |
B41J2/16;B41J2/045;B41J2/055;(IPC1-7):B41J2/16 |
主分类号 |
B41J2/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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